Functional metal oxides for sensor applications (FunALD)

Fabricating metal oxide based nanostructures for their application in gas phase sensors. The project covers precursor development and its evaluation for thin film deposition via thermal and plasma assisted atomic layer deposition

Funded by

This project has no funding.


  • Xiaofan Xie, David Zanders, Florian Preischel, Teresa de los Arcos, Anjana Devi, Guido Grundmeier: Complementary spectroscopic and electrochemical analysis of the sealing of micropores in hexamethyldisilazane plasma polymer films by Al2O3 atomic layer deposition. Surface and Interface Analysis 2023 DOI: 10.1002/sia.7256
  • Zanders D et al.: Cobalt Metal ALD: Understanding the Mechanism and Role of Zinc Alkyl Precursors as Reductants for Low-Resistivity Co Thin Films. Chem. Mater. 2021 DOI: 10.1021/acs.chemmater.1c00877
  • Mai L et al.: From Precursor Chemistry to Gas Sensors: Plasma‐Enhanced Atomic Layer Deposition Process Engineering for Zinc Oxide Layers from a Nonpyrophoric Zinc Precursor for Gas Barrier and Sensor Applications. Small 2020 DOI: 10.1002/smll.201907506
  • Mai L et al.: Potential Precursor Alternatives to the Pyrophoric Trimethylaluminium for the Atomic Layer Deposition of Aluminium Oxide. Chem. Eur. J. 2019 DOI: 10.1002/chem.201900475
  • Zanders D et al.: PEALD of HfO2 Thin Films: Precursor Tuning and a New Near-Ambient-Pressure XPS Approach to in Situ Examination of Thin-Film Surfaces Exposed to Reactive Gases. ACS Appl. Mater. Interfaces 2019 DOI: 10.1021/acsami.9b07090
  • Mai L et al.: Low-Temperature Plasma-Enhanced Atomic Layer Deposition of Tin(IV) Oxide from a Functionalized Alkyl Precursor: Fabrication and Evaluation of SnO2-Based Thin-Film Transistor Devices. ACS Appl. Mater. Interfaces 2019 DOI: 10.1021/acsami.8b16443
  • Sadlo A et al.: Investigating Zinc Ketoiminates as a New Class of Precursors for Solution Deposition of ZnO Thin Films. j nanosci nanotechnol 2019 DOI: 10.1166/jnn.2019.15739
  • Zanders D et al.: Validation of a Terminally Amino Functionalized Tetra‐Alkyl Sn(IV) Precursor in Metal–Organic Chemical Vapor Deposition of SnO 2 Thin Films: Study of Film Growth Characteristics, Optical, and Electrical Properties. Adv. Mater. Interfaces 2019 DOI: 10.1002/admi.201801540
  • Cwik S et al.: Luminescent Nd2S3 thin films: a new chemical vapour deposition route towards rare-earth sulphides. Dalton Trans. 2019 DOI: 10.1039/C8DT04317E
  • Boysen N et al.: An N-Heterocyclic Carbene Based Silver Precursor for Plasma-Enhanced Spatial Atomic Layer Deposition of Silver Thin Films at Atmospheric Pressure. Angew. Chem. Int. Ed. 2018 DOI: 10.1002/anie.201808586
  • Cwik S et al.: Direct Growth of MoS2 and WS2 Layers by Metal Organic Chemical Vapor Deposition. Adv. Mater. Interfaces 2018 DOI: 10.1002/admi.201800140
  • Mattinen M et al.: Atomic Layer Deposition of Molybdenum and Tungsten Oxide Thin Films Using Heteroleptic Imido-Amidinato Precursors: Process Development, Film Characterization, and Gas Sensing Properties. Chem. Mater. 2018 DOI: 10.1021/acs.chemmater.8b04129
  • Zywitzki D et al.: Tuning Coordination Geometry of Nickel Ketoiminates and Its Influence on Thermal Characteristics for Chemical Vapor Deposition of Nanostructured NiO Electrocatalysts. Inorg. Chem. 2020 DOI: 10.1021/acs.inorgchem.0c01204
  • Wree J et al.: A new metalorganic chemical vapor deposition process for MoS2 with a 1,4-diazabutadienyl stabilized molybdenum precursor and elemental sulfur. Dalton Trans. 2020 DOI: 10.1039/D0DT02471F
  • Nils Boysen, Anish Philip, Detlef Rogalla, Maarit Karppinen, Anjana Devi: Role of Anionic Backbone in NHC-Stabilized Coinage Metal Complexes: New Precursors for Atomic Layer Deposition. Chemistry – A European Journal 2022 DOI: 10.1002/chem.202103798
  • Jan-Lucas Wree, Jean-Pierre Glauber, David Zanders, Detlef Rogalla, Malte Becher, Matthew B. E. Griffiths, Andreas Ostendorf, Seán T. Barry, Andreas Ney, and Anjana Devi: Ferromagnetic Cobalt Disulfide: A CVD Pathway Toward High-Quality and Phase-Pure Thin Films. ACS Appl. Electron. Mater. 2022
  • Jan-Lucas Wree, Detlef Rogalla, Andreas Ostendorf, Klaus D. Schierbaum, and Anjana Devi: Plasma-Enhanced Atomic Layer Deposition of Molybdenum Oxide Thin Films at Low Temperatures for Hydrogen Gas Sensing. ACS Appl. Mater. Interfaces 2023 DOI: 10.1021/acsami.2c19827


  • David Zanders: - Novel Hafnium and Tin precursors - Tuning Precursor Chemistry for Plasma Enhanced and Conventional Atomic Layer Deposition Processes (Master's thesis, 2018)