Methods used

• NRRA - Nuclear Resonant Reaction Analysis
• RBS - Rutherford Backscattering Spectrometry
• D-NRA - Nuclear Reaction Analysis using a deuteron beam

Funded by

Publications

• Xiaofan Xie, David Zanders, Florian Preischel, Teresa de los Arcos, Anjana Devi, Guido Grundmeier: Complementary spectroscopic and electrochemical analysis of the sealing of micropores in hexamethyldisilazane plasma polymer films by Al2O3 atomic layer deposition. Surface and Interface Analysis 2023 DOI: 10.1002/sia.7256
• Zanders D et al.: Cobalt Metal ALD: Understanding the Mechanism and Role of Zinc Alkyl Precursors as Reductants for Low-Resistivity Co Thin Films. Chem. Mater. 2021 DOI: 10.1021/acs.chemmater.1c00877
• Mai L et al.: From Precursor Chemistry to Gas Sensors: Plasma‐Enhanced Atomic Layer Deposition Process Engineering for Zinc Oxide Layers from a Nonpyrophoric Zinc Precursor for Gas Barrier and Sensor Applications. Small 2020 DOI: 10.1002/smll.201907506
• Mai L et al.: Potential Precursor Alternatives to the Pyrophoric Trimethylaluminium for the Atomic Layer Deposition of Aluminium Oxide. Chem. Eur. J. 2019 DOI: 10.1002/chem.201900475
• Zanders D et al.: PEALD of HfO2 Thin Films: Precursor Tuning and a New Near-Ambient-Pressure XPS Approach to in Situ Examination of Thin-Film Surfaces Exposed to Reactive Gases. ACS Appl. Mater. Interfaces 2019 DOI: 10.1021/acsami.9b07090
• Mai L et al.: Low-Temperature Plasma-Enhanced Atomic Layer Deposition of Tin(IV) Oxide from a Functionalized Alkyl Precursor: Fabrication and Evaluation of SnO2-Based Thin-Film Transistor Devices. ACS Appl. Mater. Interfaces 2019 DOI: 10.1021/acsami.8b16443
• Sadlo A et al.: Investigating Zinc Ketoiminates as a New Class of Precursors for Solution Deposition of ZnO Thin Films. j nanosci nanotechnol 2019 DOI: 10.1166/jnn.2019.15739
• Zanders D et al.: Validation of a Terminally Amino Functionalized Tetra‐Alkyl Sn(IV) Precursor in Metal–Organic Chemical Vapor Deposition of SnO 2 Thin Films: Study of Film Growth Characteristics, Optical, and Electrical Properties. Adv. Mater. Interfaces 2019 DOI: 10.1002/admi.201801540
• Cwik S et al.: Luminescent Nd2S3 thin films: a new chemical vapour deposition route towards rare-earth sulphides. Dalton Trans. 2019 DOI: 10.1039/C8DT04317E
• Boysen N et al.: An N-Heterocyclic Carbene Based Silver Precursor for Plasma-Enhanced Spatial Atomic Layer Deposition of Silver Thin Films at Atmospheric Pressure. Angew. Chem. Int. Ed. 2018 DOI: 10.1002/anie.201808586
• Cwik S et al.: Direct Growth of MoS2 and WS2 Layers by Metal Organic Chemical Vapor Deposition. Adv. Mater. Interfaces 2018 DOI: 10.1002/admi.201800140
• Mattinen M et al.: Atomic Layer Deposition of Molybdenum and Tungsten Oxide Thin Films Using Heteroleptic Imido-Amidinato Precursors: Process Development, Film Characterization, and Gas Sensing Properties. Chem. Mater. 2018 DOI: 10.1021/acs.chemmater.8b04129
• Zywitzki D et al.: Tuning Coordination Geometry of Nickel Ketoiminates and Its Influence on Thermal Characteristics for Chemical Vapor Deposition of Nanostructured NiO Electrocatalysts. Inorg. Chem. 2020 DOI: 10.1021/acs.inorgchem.0c01204
• Wree J et al.: A new metalorganic chemical vapor deposition process for MoS2 with a 1,4-diazabutadienyl stabilized molybdenum precursor and elemental sulfur. Dalton Trans. 2020 DOI: 10.1039/D0DT02471F
• Nils Boysen, Anish Philip, Detlef Rogalla, Maarit Karppinen, Anjana Devi: Role of Anionic Backbone in NHC-Stabilized Coinage Metal Complexes: New Precursors for Atomic Layer Deposition. Chemistry – A European Journal 2022 DOI: 10.1002/chem.202103798
• Jan-Lucas Wree, Jean-Pierre Glauber, David Zanders, Detlef Rogalla, Malte Becher, Matthew B. E. Griffiths, Andreas Ostendorf, Seán T. Barry, Andreas Ney, and Anjana Devi: Ferromagnetic Cobalt Disulfide: A CVD Pathway Toward High-Quality and Phase-Pure Thin Films. ACS Appl. Electron. Mater. 2022
• Jan-Lucas Wree, Detlef Rogalla, Andreas Ostendorf, Klaus D. Schierbaum, and Anjana Devi: Plasma-Enhanced Atomic Layer Deposition of Molybdenum Oxide Thin Films at Low Temperatures for Hydrogen Gas Sensing. ACS Appl. Mater. Interfaces 2023 DOI: 10.1021/acsami.2c19827

Theses

• David Zanders: - Novel Hafnium and Tin precursors - Tuning Precursor Chemistry for Plasma Enhanced and Conventional Atomic Layer Deposition Processes (Master's thesis, 2018)