Surface chemical characterization of ALD and CVD deposited thin films

This project supports the other ongoing RUBION-projects of RUB's IMC group. Complementary to the RBS/NRA project, selected thin films are subjected to XPS and AES analysis to gain insights into their surface chemical composition.

Funded by

This project has no funding.


  • Zywitzki D et al.: Tuning Coordination Geometry of Nickel Ketoiminates and Its Influence on Thermal Characteristics for Chemical Vapor Deposition of Nanostructured NiO Electrocatalysts. Inorg. Chem. 2020 DOI: 10.1021/acs.inorgchem.0c01204
  • Boysen N et al.: A carbene stabilized precursor for the spatial atomic layer deposition of copper thin films. Chem. Commun. 2020 DOI: 10.1039/D0CC05781A


This project has no theses.