Surface chemical characterization of ALD and CVD deposited thin films
This project supports the other ongoing RUBION-projects of RUB's IMC group. Complementary to the RBS/NRA project, selected thin films are subjected to XPS and AES analysis to gain insights into their surface chemical composition.
Funded by
This project has no funding.Publications
- Florian Preischel, David Zanders, Thomas Berning, Aleksander Kostka, Detlef Rogalla, Claudia Bock, Anjana Devi: Interplay of Precursor and Plasma for The Deposition of HfO2 via PEALD: Film Growth and Dielectric Properties. Advanced Material Interfaces 2023 DOI: 10.1002/admi.202
- Parmish Kaur, Lukas Mai, Arbresha Muriqi, David Zanders, Ramin Ghiyasi, Muhammad Safdar, Nils Boysen, Manuela Winter, Michael Nolan, MaaritKarppinen, Anjana Devi: Rational Development of Guanidinate and Amidinate Based Cerium and Ytterbium Complexes as Atomic Layer Deposition Precursors: Synthesis, Modeling, and Application. Chemistry A European Journal 2021 DOI: 10.1002/chem.202003907
- Zywitzki D et al.: Tuning Coordination Geometry of Nickel Ketoiminates and Its Influence on Thermal Characteristics for Chemical Vapor Deposition of Nanostructured NiO Electrocatalysts. Inorg. Chem. 2020 DOI: 10.1021/acs.inorgchem.0c01204
- Boysen N et al.: A carbene stabilized precursor for the spatial atomic layer deposition of copper thin films. Chem. Commun. 2020 DOI: 10.1039/D0CC05781A
- Boysen N et al.: Atomic layer deposition of dielectric Y2O3 thin films from a homoleptic yttrium formamidinate precursor and water. RSC Adv. 2021 DOI: 10.1039/D0RA09876K
- Yu P et al.: Fabrication of GdxFeyOz films using an atomic layer deposition-type approach. CrystEngComm 2021 DOI: 10.1039/D0CE01252A
- Beer S.M. et al.: Direct liquid injection chemical vapor deposition of ZrO2 films from a heteroleptic Zr precursor: interplay between film characteristics and corrosion protection of stainless steel. Journal of Materials Research and Technology 2021 DOI: 10.1016/j.jmrt.2021.05.068
- Martin Wilken,Engin Ciftyürek,Stefan Cwik,Lukas Mai,Bert Mallick,Detlef Rogalla,Klaus Schierbaum,Anjana Devi: CVD Grown Tungsten Oxide for Low Temperature Hydrogen Sensing: Tuning Surface Characteristics via Materials Processing for Sensing Applications. Small 2022 DOI: 10.1002/smll.202204636