Thin-film refractory metamaterials for Thermophotovoltaik

Thin film refractory metamaterials for high-temperature application are prepared by magnetron sputtering and characterized by non-ambient x-ray diffraction. An interesting candidate is a multilayered structure of metallic tungsten and dielectric hafnia. During annealing we observed structural changes of the obtained phases which require a confirmation with further methods. It is planned to carry out RBS and XPS measurements of three different sub-units (3-layer-stacks: as prepared and after two different annealing temperatures).

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